Figure. 17.2. (a) Synthesis precursors for g-C3N4 preparation; (b) synthesis procedure using cyanamide, urea,
thiourea, and melamine for g-C3N4.
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Bioremediation for Sustainable Environmental Cleanup
Figure 17.2(a). Synthesis precursors for g-C3N4 preparation; (b) synthesis procedure using urea, thiourea, cyanamide and
melamine for g-C3N4.
electron pairs on pz orbitals. This results in the formation of a highly delocalized conjugated system
(Hao et al. 2020, Li et al. 2019). The electron-hole recombination rate of bulk g-C3N4 is relatively
high because of the presence of low-coordinated N atoms in both the Conduction band (CB) and the
valence band (VB) that forms low delocalization bonds.
Most researchers are interested in how to modify g-C3N4 to improve its photocatalytic
performance (Mishra et al. 2019, Zhang et al. 2019), such as converting energy, breaking down
pollutants (Ren et al. 2019) and controlling microbes, etc. (Zhang et al. 2019).
Even though some studies offer suggestions for how to alter g-C3N4, a comprehensive analysis of
the fabrication of g-C3N4 with varied dimensionalities and their implications on diverse applications
connected to the environment and energy has not yet been done. This chapter provides an up-to-date
review of how to make g-C3N4 with different dimensions and how it can be used for energy and the
environment. Additionally, an overview of the research’s state and suggestions on how g-C3N4 will
develop in the future and what it could be used for has been provided.
17.3 g-C3N4 Preparation
The production of g-C3N4 has been done using a variety of synthetic methods (Figure 17.3). Here
the numerous ways by which g-C3N4 may be made synthetically, most notably Chemical Vapor
Deposition (CVD), electrochemical deposition, thermal decomposition, solid-state reactions and
solvothermal reactions are summarized (Figure 17.4).
17.3.1 Chemical Vapor Deposition (CVD)
“A vacuum deposition technique called chemical vapor deposition (CVD) is used to create high-
quality, high-performance solid materials.” Ye et al. 2016 carried out chemical vapor deposition
(CVD) to develop a layer of graphitic carbon nitride on Indium-Tin-Oxide (ITO). In this procedure,